Polycrystalline Diamond Liquid for Wafer Polishing

Product Details
Customization: Available
Type: Diamond
Classification of Diamond: Artificial
Manufacturer/Factory, Trading Company
Diamond Member Since 2019

Suppliers with verified business licenses

Audited Supplier

Audited by an independent third-party inspection agency

Importers and Exporters
The supplier has import and export rights
Fast Delivery
The supplier can deliver the goods within 15 days
R&D Capabilities
The supplier has 1 R&D engineers, you can check the Audit Report for more information
to see all verified strength labels (6)
  • Polycrystalline Diamond Liquid for Wafer Polishing
  • Polycrystalline Diamond Liquid for Wafer Polishing
  • Polycrystalline Diamond Liquid for Wafer Polishing
  • Polycrystalline Diamond Liquid for Wafer Polishing
  • Polycrystalline Diamond Liquid for Wafer Polishing
  • Polycrystalline Diamond Liquid for Wafer Polishing
Find Similar Products

Basic Info.

Model NO.
HID SDS
Characteristic
Silicon Carbide, Diamond
Characteristics of Natural Diamond
Grinding and Polishing
Application
Polishing of Magnetic Recording Material
Feature
High Efficiency
Types
Abrasive
Usage
Surface Polishing
Auxiliary Equipment
Polishing Pad, Grinding Disc
Transport Package
Bottle
Specification
500 ml per Bottle
Trademark
Harmony
Origin
Zhengzhou China
HS Code
34059000
Production Capacity
80, 000 Liter

Product Description

Diamond Slurry
HID can provide a variety of surface precision grinding and polishing diamond grinding liquid products, including oil soluble, water soluble and other different media types of polycrystalline diamond, single crystal diamond, nano diamond and other abrasive types, for different materials, different requirements of precision grinding and polishing to provide a rich choice.

Nano Diamond Slurry Grade HID-NDS
Feature:
It has the unique spherical microcrystalline loose structure of nano-diamond;
Unique hyperdispersion technology makes the product have good dispersion effect;
Angstrom-level surface processing effect can be achieved.

Specification:
Size(um) 50 80 100 150 200 300 400 500
Media Water / Oil Water / Oil Water / Oil Water / Oil Water / Oil Water / Oil Water / Oil Water / Oil

Application:
Semiconductor wafer polishing: single crystal silicon wafer, polycrystalline silicon wafer, sapphire wafer, silicon carbide wafer, etc.;
Polishing of magnetic recording materials: computer hard disk substrates, computer hard disk heads, etc.

Single Crystal Diamond Slurry Grade HID-SDS
Feature:
Selected particle shapes
Strict granularity control
Unique formulations for different applications.

Specification:
Size(um) Media Size(um) Media Size(um) Media
0.05 Water / Oil 0-1 Water / Oil 8-16 Water / Oil
0.08 Water / Oil 1-2 Water / Oil 10-20 Water / Oil
0.1 Water / Oil 1-3 Water / Oil 20-30 Water / Oil
0.2 Water / Oil 2-4 Water / Oil 30-40 Water / Oil
0.25 Water / Oil 4-8 Water / Oil 40-60 Water / Oil
0.5 Water / Oil 6-12 Water / Oil   Water / Oil

Application:
1. Metal material processing: stainless steel, die steel, aluminum alloy and other metal materials
2. Other material processing: optical glass, cemented carbide, etc.
Polycrystalline Diamond Liquid for Wafer Polishing
Polycrystalline Diamond Liquid for Wafer Polishing

Polycrystalline Diamond Slurry Grade HID-PDS
Feature:
Selected polycrystalline diamond abrasives;
High cutting force and good surface processing effect can be achieved in the processing of high hardness wafers;
A variety of carriers are available for different processing areas.

Specification:
Size(um) Media Size(um) Media Size(um) Media
0.05 Water / Oil 0-1 Water / Oil 8-16 Water / Oil
0.08 Water / Oil 1-2 Water / Oil 10-20 Water / Oil
0.1 Water / Oil 1-3 Water / Oil 20-30 Water / Oil
0.2 Water / Oil 2-4 Water / Oil 30-40 Water / Oil
0.25 Water / Oil 4-8 Water / Oil 40-60 Water / Oil
0.5 Water / Oil 6-12 Water / Oil   Water / Oil

Application:
1. Semiconductor wafer processing: mainly including sapphire substrates, silicon carbide wafers, sapphire windows, etc.
2. Ceramic processing: zirconia fingerprint identification sheet, zirconia ceramic mobile phone back shell and other functional ceramics
3. Metal material processing: stainless steel, die steel, aluminum alloy and other metal materials.

Polycrystalline-Like Diamond Slurry Grade HID-PLDS
Feature:
It is an economical alternative to polycrystalline diamond slurry;
The grinding effect of polycrystalline diamond slurry can be achieved in the processing of various semiconductor wafers.

Specification:
Size(um) 0.25 0.5 1 3 4 6
Media Water / Oil Water / Oil Water / Oil Water / Oil Water / Oil Water / Oil

Application:
Semiconductor wafer processing: mainly including sapphire substrates, silicon carbide wafers, sapphire windows, etc.
Ceramic material processing: zirconia fingerprint identification sheet, zirconia ceramic mobile phone back shell and other functional ceramics
Metal material processing: stainless steel, die steel, aluminum alloy and other metal materials.
Polycrystalline Diamond Liquid for Wafer Polishing
Polycrystalline Diamond Liquid for Wafer Polishing

Henan Harmony Industry Diamond Co., Ltd. (H.I.D.) is mainly specialized in manufacturing and supplying synthetic industrial diamond, cBn and its series of products in China. We insist on research and development of precision grinding and polishing diamond materials as well as its end products.
H.I.D.'s mission is to provide superior performance to end users through innovative solutions and superior quality. Our raw materials are sourced from suppliers with strict quality control. We insist on producing products that exceed international standards, high purity, high wear resistance, and provide customized, innovative, high-performance products to meet customers' various application requirements.
Polycrystalline Diamond Liquid for Wafer Polishing

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now
Contact Supplier